LEADER 00000cam a2200625Mi 4500 001 958799784 003 OCoLC 005 20240129213017.0 006 m o d 007 cr cn||||||||| 008 160914s2016 flua ob 001 0 eng d 019 963347615|a964569183|a964924275|a965146051|a1006797201 |a1066629222|a1153188773|a1273311445|a1273313272 020 9781482236118|q(electronic bk.) 020 1482236117|q(electronic bk.) 029 1 AU@|b000065175744 029 1 AU@|b000070608123 035 (OCoLC)958799784|z(OCoLC)963347615|z(OCoLC)964569183 |z(OCoLC)964924275|z(OCoLC)965146051|z(OCoLC)1006797201 |z(OCoLC)1066629222|z(OCoLC)1153188773|z(OCoLC)1273311445 |z(OCoLC)1273313272 040 CRCPR|beng|erda|epn|cCRCPR|dOCLCO|dOCLCF|dYDX|dOCLCQ|dN$T |dEZ9|dOCLCQ|dWYU|dAU@|dRDF|dOCLCO|dOCLCQ|dSFB|dOCLCQ |dOCLCO 049 INap 082 04 681.25 082 04 681.25 100 1 Sirohi, R. S. 245 10 Introduction to optical metrology /|cRajpal S. Sirohi, Tezpur University, India. 246 30 Optical metrology 264 1 Boca Raton :|bCRC Press, Taylor & Francis Group,|c[2016] 300 1 online resource :|btext file, PDF. 336 text|btxt|2rdacontent 337 computer|bc|2rdamedia 338 online resource|bcr|2rdacarrier 490 1 Optical sciences and applications of light 504 Includes bibliographical references and index. 505 00 Machine generated contents note:|g1.1.|tIntroduction -- |g1.2.|tLaw of Reflection --|g1.3.|tLaw of Refraction -- |g1.4.|tInterference --|g1.5.|tDiffraction --|g1.5.1. |tPropagation of a Monochromatic Wave --|g1.5.2. |tKirchhoff Theory of Diffraction --|g1.5.3.|tSmall Angle Approximation --|g1.5.4.|tFresnel Approximation --|g1.5.5. |tFraunhofer Approximation --|g1.6.|tPolarization -- |g1.6.1.|tPolarization Ellipse --|g1.6.2.|tRepresentation of Polarization --|g1.6.2.1.|tJones Vector --|g1.6.2.2. |tStokes Vector --|g1.7.|tFresnel Equations --|g1.8.|tThin Film Optics --|g1.9.|tOptical Components --|g1.9.1. |tReflective Components --|g1.9.1.1.|tMirror --|g1.9.2. |tRefractive Components --|g1.9.2.1.|tRefraction at Dielectric Interface --|g1.9.3.|tDiffractive Components -- |g1.10.|tRefraction at Curved Interface --|g1.10.1. |tLenses --|g1.11.|tParaxial Optics --|g1.11.1. |tTranslation Matrix --|g1.11.2.|tRefraction Matrix -- |g1.11.2.1.|tPlane Dielectric Interface --|g1.11.2.2. |tSpherical Dielectric Interface --|g1.11.3.|tMatrix for a Thin Lens --|tProblems --|g2.1.|tGaussian Beams --|g2.2. |tThe ABCD Law for Gaussian Beams --|g2.2.1.|tFree Space Propagation --|g2.2.2.|tPropagation through a Lens -- |g2.2.2.1.|tBeam Waist Lies at Plane 1 at the Lens -- |g2.2.2.2.|tBeam Waist Lies in Front of the Lens -- |g2.2.2.3.|tBeam Focusing --|g2.3.|tLaser Collimator -- |g2.4.|tVortex Beams --|g2.5.|tBessel Beams --|tProblems - -|g3.1.|tIntroduction --|g3.2.|tRadiometric Units --|g3.3. |tBlackbody --|g3.4.|tLight Sources --|g3.4.1. |tIncandescent Tungsten Lamps --|g3.4.2.|tTungsten-Halogen Lamps --|g3.4.3.|tDischarge Lamps --|g3.4.4.|tCoherent Sources --|g3.4.4.1.|tHelium-Neon Laser --|g3.4.4.2. |tArgon Ion Laser --|g3.4.4.3.|tNd:YAG/Nd:Glass Laser -- |g3.4.4.4.|tSemiconductor Lasers --|g3.5.|tDetectors -- |g3.5.1.|tEye --|g3.5.2.|tPhotoelectric Detectors -- |g3.5.2.1.|tPhotoemis sive Detectors --|g3.5.2.2. |tPhotomultipliers --|g3.5.2.3.|tPhotoconductive Detectors --|g3.5.2.4.|tPhotovoltaic Detectors --|g3.5.2.5. |tAvalanche Photodiode --|g3.5.3.|tThermal Detectors -- |g3.6.|tRecording Media --|g3.6.1.|tPhotographic/ Holographic Plates and Films --|g3.6.2.|tDichromated Gelatin --|g3.6.3.|tPhotoresists --|g3.6.4.|tPhotopolymers --|g3.6.5.|tThermoplastics --|g3.6.6.|tPhotochromics -- |g3.6.7.|tFerroelectric Crystals --|g3.7.|tImage Detectors --|g3.7.1.|tTime Delay and Integration Mode of Operation - -|g3.8.|tSpatial Light Modulators --|tProblems --|g4.1. |tIntroduction --|g4.2.|tEarly History --|g4.2.1.|tArrival of Laser --|g4.3.|tGeneration of Coherent Waves/Sources -- |g4.3.1.|tWave Front Division: Double-Slit Experiment -- |g4.3.2.|tAmplitude Division: Plane Parallel Plate -- |g4.4.|tFringe Patterns --|g4.4.1.|tInterference between Two Plane Waves --|g4.4.2.|tInterference between Two Plane Waves of Slightly Different Frequencies --|g4.5.|tSome More Interferometers --|g4.5.1.|tTwo-Frequency Interferometer --|g4.5.2.|tDoppler Interferometer -- |g4.5.3.|tCyclic Interferometer --|g4.5.4.|tShear Interferometer --|g4.6.|tPhase Shifting --|g4.6.1. |tTemporal Phase Shifting --|g4.6.2.|tSpatial Phase Shifting --|tProblems --|g5.1.|tHolography and Hologram Interferometry --|g5.1.1.|tHologram Recording --|g5.1.2. |tReconstruction --|g5.1.3.|tIn-Line Holography --|g5.1.4. |tOff-Axis Holography --|g5.1.4.1.|tChoice of Angle of the Reference Wave --|g5.1.4.2.|tChoice of Intensity of the Reference Wave --|g5.1.5.|tTypes of Holograms --|g5.1.5.1. |tDiffraction Efficiency --|g5.1.6.|tExperimental Arrangement --|g5.1.6.1.|tLasers --|g5.1.6.2.|tBeam Splitters --|g5.1.6.3.|tBeam Expanders --|g5.1.6.4. |tObject Illumination Beam --|g5.1.6.5.|tReference Beam -- |g5.1.6.6.|tAngle between Object and Reference Beams -- |g5.1.7.|tHolographic Recording Materials --|g5.1.8. |tHolographic Interferometry --|g5.1.8.1.|tReal-Time HI -- |g5.1.8.2.|tDouble-Exposure HI --|g5.1.8.3.|tTime-Average HI --|g5.1.8.4.|tReal-Time, Time-Average HI --|g5.1.8.5. |tStroboscopic Illumination/Stroboscopic HI --|g5.1.9. |tSpecial Techniques in Holographic Interferometry -- |g5.1.9.1.|tTwo-Reference Beam HI --|g5.1.9.2.|tSandwich HI --|g5.1.9.3.|tReflection HI --|g5.1.9.4.|tHeterodyne HI --|g5.1.10.|tHolographic Contouring/Shape Measurement -- |g5.1.10.1.|tDual-Wavelength Method --|g5.1.10.2.|tDual- Refractive Index Method --|g5.1.10.3.|tDual-Illumination Method --|g5.1.11.|tDigital Holography --|g5.1.11.1. |tRecording of Digital Holograms --|g5.1.11.2. |tReconstruction of Digital Holograms --|g5.1.12.|tDigital Holographic Interferometry --|g5.1.13.|tFringe Formation and Measurement of Displacement Vector --|g5.1.14. |tLoading of the Object --|g5.2.|tSpeckle Phenomenon, Speckle Photography, and Speckle Interferometry --|g5.2.1. |tSpeckle Phenomenon --|g5.2.2.|tAverage Speckle Size -- |g5.2.2.1.|tObjective Speckle Pattern --|g5.2.2.2. |tSubjective Speckle Pattern --|g5.2.3.|tRelation between Object Displacement and Speckle Shift --|g5.2.3.1.|tIn- Plane Displacement --|g5.2.3.2.|tOut-of-Plane Displacement --|g5.2.3.3.|tTilt of the Object --|g5.2.4.|tSpeckle Photography --|g5.2.5.|tMethods of Evaluation --|g5.2.5.1. |tPoint-Wise Filtering Method --|g5.2.5.2.|tWhole-Field Filtering --|g5.2.5.3.|tFourier Filtering Method: Measurement of Out-of-Plane Displacement --|g5.2.6. |tSpeckle Photography with Vibrating Objects: In-Plane Vibration --|g5.2.7.|tSensitivity of Speckle Photography - -|g5.2.8.|tParticle Image Velocimetry --|g5.2.9.|tWhite Light Speckle Photography --|g5.2.10.|tShear Speckle Photography --|g5.2.11.|tSpeckle Interferometry -- |g5.2.12.|tCorrelation Coefficient in Speckle Interferometry --|g5.2.13.|tOut-of-Plane Speckle Interferometer --|g5.2.14.|tIn-Plane Measurement: Duffy's Method --|g5.2.14.1.|tFiltering --|g5.2.14.2.|tFringe Formation --|g5.2.14.3.|tDuffy's Arrangement: Enhanced Sensitivity --|g5.2.15.|tSpeckle Shear Interferometry -- |g5.2.15.1.|tMeaning of Shear --|g5.2.15.2.|tMethods of Shearing --|g5.2.15.3.|tTheory of Speckle Shear Interferometry --|g5.2.15.4.|tFringe Formation -- |g5.2.15.5.|tShear Interferometry without the Influence of In-Plane Component --|g5.2.16.|tElectronic Speckle Pattern Interferometry --|g5.2.16.1.|tOut-of-Plane Displacement Measurement --|g5.2.16.2.|tIn-Plane Displacement Measurement --|g5.2.16.3.|tVibration Analysis -- |g5.2.16.4.|tMeasurement on Small Objects --|g5.2.17. |tShear ESPI Measurement --|g5.2.18.|tContouring in ESPI- Shape Measurement --|g5.2.18.1.|tChange of Direction of Illumination --|g5.2.18.2.|tChange of Wavelength -- |g5.2.18.3.|tChange of Medium Surrounding the Object -- |g5.2.18.4.|tTilt of the Object --|g5.3.|tMoire Phenomena --|g5.3.1.|tFormation of Moire Pattern --|g5.3.1.1.|tMoire Fringe Pattern between Two Linear Gratings --|g5.3.2. |tMoire between Reference and Deformed Gratings -- |g5.3.2.1.|tReference and Deformed Gratings Oriented along Y-Axis --|g5.3.2.2.|tReference Grating Inclined -- |g5.3.2.3.|tGratings with Different Periods --|g5.3.3. |tDerivative of Distortion Function --|g5.3.4.|tMoire Pattern with Deformed Sinusoidal Grating --|g5.3.4.1. |tMultiplicative Moire Pattern --|g5.3.4.2.|tAdditive Moire Pattern --|g5.3.5.|tTalbot Phenomenon --|g5.3.5.1. |tTalbot Effect in Collimated Illumination --|g5.3.5.2. |tCut-Off Distance --|g5.3.5.3.|tTalbot Effect in Noncollimated Illumination --|g5.4.|tPhotoelasticity -- |g5.4.1.|tSuperposition of. 505 00 |tTwo Plane Polarized Waves --|g5.4.1.1.|tLinear Polarization --|g5.4.1.2.|tCircular Polarization -- |g5.4.2.|tProduction of Polarized Light --|g5.4.2.1. |tReflection --|g5.4.2.2.|tRefraction --|g5.4.2.3.|tDouble Refraction --|g5.4.3.|tOptical Elements from Crystals -- |g5.4.3.1.|tPolarizers --|g5.4.3.2.|tPhase Plates -- |g5.4.4.|tDichroism --|g5.4.5.|tScattering --|g5.4.6. |tMalus Law --|g5.4.7.|tStress-Optic Law --|g5.4.8. |tStrain-Optic Law --|g5.4.9.|tMethods of Analysis -- |g5.4.9.1.|tPlane Polariscope --|g5.4.9.2.|tCircular Polariscope --|g5.4.9.3.|tEvaluation Procedure --|g5.4.10. |tMeasurement of Fractional Fringe Order --|g5.4.10.1. |tTardy's Method --|g5.4.11.|tPhase Shifting --|g5.4.11.1. |tI soclinics Computation --|g5.4.11.2.|tComputation of Isochromatics --|g5.4.12.|tBirefringent Coating Method- Reflection Polariscope --|g5.4.13.|tHolophotoelasticity -- |g5.4.13.1.|tSingle-Exposure Holophotoelasticity -- |g5.4.13.2.|tDouble-Exposure Holophotoelasticity -- |g5.4.14.|tThree-Dimensional Photoelasticity --|g5.4.14.1. |tFrozen Stress Method --|g5.4.14.2.|tScattered Light Photoelasticity --|g5.5.|tMicroscopy --|g5.5.1.|tSimple Magnifier --|g5.5.2.|tCompound Microscope --|g5.5.3. |tKohler Illumination --|g5.5.4.|tEmpty Magnification -- |g5.5.5.|tDepth of Field --|g5.5.6.|tDepth of Focus -- |g5.5.7.|tContrast-Enhancing Techniques --|g5.5.7.1.|tDark Field Microscopy --|g5.5.7.2.|tRheinburg Illumination -- |g5.5.7.3.|tPhase Contrast Microscopy --|g5.5.7.4. |tInterference Microscopy --|g5.5.7.5.|tPolarization Microscopy --|g5.5.7.6.|tHoffman Modulation Contrast -- |g5.5.7.7.|tDifferential Interference Contrast Microscopy --|g5.5.8.|tMetrological Microscope --|g5.5.9.|tConfocal Scanning Optical Microscope --|tProblems --|g6.1. |tIntroduction --|g6.2.|tSpectrometer --|g6.3.|tGoniometer --|g6.3.1.|tMeasurement of Refractive Index of a Liquid -- |g6.3.2.|tHilger-Chance Refractometer --|g6.4.|tMethods Based on the Measurement of Critical Angle --|g6.4.1. |tPulfrich Refractometer --|g6.4.2.|tAbbe Refractometer -- |g6.5.|tMeasurement of Brewster Angle --|g6.6. |tEllipsometry --|g6.6.1.|tNull Ellipsometry --|g6.6.2. |tPhotometric Ellipsometry --|g6.6.3.|tOptical Constants of a Sample --|g6.6.4.|tOptical Constant of a Thin Film -- |g6.7.|tSpectral Transmission Measurement --|g6.7.1. |tRefractive Index of the Substrate --|g6.8. |tInterferometry --|tProblems --|g7.1.|tIntroduction 505 00 Note continued:|g7.2.|tMeasurement of Radius of Curvature --|g7.2.1.|tIndirect Method: Measurement of the Sagitta -- |g7.2.1.1.|tMechanical Spherometer --|g7.2.2.|tDirect Methods --|g7.2.2.1.|tImage Formation --|g7.2.2.2. |tDifferences in Conjugate Positions --|g7.2.2.3.|tOptical Spherometer --|g7.2.2.4.|tMeasurement of Long Radius of Curvature --|g7.2.2.5.|tCavity Method-Measurement of Long Radius of Curvature of a Concave Surface --|g7.2.2.6. |tMeasurement of Very Long Radii of Curvature --|g7.2.2.7. |tRadius of Curvature with a Test Plate --|g7.2.2.8. |tNewton's Rings Method --|g7.3.|tScanning Profilometry -- |g7.4.|tRadius of Curvature Measurement by Talbot Interferometry --|g7.5.|tMeasurement of Focal Length -- |g7.5.1.|tFocal Length of a Thin Lens --|g7.5.1.1.|tFocal Length by Imaging --|g7.5.1.2.|ty'/tan 0' Method -- |g7.5.1.3.|tMagnification Method --|g7.5.1.4.|tFocal Length of a Negative/Diverging Lens --|g7.5.1.5.|tNodal Slide Method --|g7.5.1.6.|tFocal Length Measurement from the Difference between Conjugate Positions --|g7.6.|tMoire Deflectometry --|tProblems --|g8.1.|tTesting of a Flat Surface --|g8.1.1.|tLiquid Surface as a Reference -- |g8.1.2.|tCalibration by Three-Flat Method --|g8.2. |tTesting of Spherical Surfaces --|g8.2.1.|tScatter-Plate Interferometer --|g8.2.2.|tPoint Diffraction Interferometer --|g8.2.3.|tLaser Unequal Path Interferometer --|g8.2.4.|tFizeau Interferometer -- |g8.2.5.|tShack Cube Interferometer --|g8.3.|tTesting of Aspherical Surfaces --|g8.3.1.|tNull Test with a Computer- Generated Hologram --|g8.4.|tOblique Incidence Interferometer --|g8.5.|tShear Interferometry --|g8.6. |tLong Wavelength Interferometry --|tProblems --|g9.1. |tDefinition of an Angle --|g9.2.|tAutocollimator -- |g9.2.1.|tMeasurement of Angle of a Glass Wedge --|g9.2.2. |tAngle of a Prism --|g9.2.3.|tMeasurement of Error in 90° Angle of a Right-Angle Prism --|g9.2.4.|tMeasurement of Error in 45° Angle of a Right-Angle Prism --|g9.2.5. |tTesting of a Pentaprism --|g9.3.|tGoniometer --|g9.3.1. |tMeasurement of Absolute Angle --|g9.4.|tInterferometry - -|g9.4.1.|tAngle of a Wedge Plate --|g9.4.2.|tAngle between the Surfaces of an Opaque Plate or a Long Cylinder /Bar --|g9.4.3.|tInterferometric Testing of Prisms -- |g9.4.3.1.|tTesting of a Right-Angle Prism --|tProblems -- |g10.1.|tTriangulation-Based Probe --|g10.2.|tSpectral Reflectometry --|g10.3.|tEllipsometry --|g10.4. |tInterferometry --|g10.4.1.|tFringes of Equal Chromatic Order --|g10.4.2.|tFizeau Fringes --|g10.4.3.|tMichelson Interferometer --|g10.4.4.|tHaidinger Fringes --|g10.5. |tLow Coherence Interferometry --|g10.6.|tConfocal Microscopy --|g10.7.|tLight Section Microscopy -- |tProblems --|g11.1.|tIntroduction --|g11.2.|tScattering from a Moving Particle-Doppler Shift --|g11.2.1. |tReference Beam Mode --|g11.2.2.|tFringe Mode --|g11.3. |tScatter Light Beams Anemometry --|g11.4.|tMultichannel LDA Systems --|g11.5.|tSignal Processing --|g11.6. |tParticle Image Velocimetry --|g11.7.|tMeasurement of Very High Velocity --|tProblems --|g12.1.|tPressure Sensitive Paint --|g12.2.|tMeasurement of Pressure with Photoelastic Material --|g12.3.|tRuby Pressure Standard -- |g12.4.|tFabry-Perot Etalon as Pressure Sensor --|g12.4.1. |tFP Etalon with Flexible Mirrors --|g12.4.2.|tChange of Refractive Index --|tProblems --|g13.1.|tIntroduction -- |g13.2.|tIntensity Modulation --|g13.2.1.|tDisplacement Measurement: Lateral Shift between the Fibers --|g13.2.2. |tDisplacement Sensor: Beam Attenuation --|g13.2.3. |tProximity Probe --|g13.2.4.|tMicrobend Displacement or Pressure Sensor --|g13.2.5.|tMeasurement of the Refractive Index of Liquids: Fiber Optic Refractometer --|g13.3. |tPhase Modulation --|g13.3.1.|tInterferometric Sensors -- |g13.3.1.1.|tTemperature Measurement --|g13.3.1.2.|tFiber Optic Pressure Sensor --|g13.3.1.3.|tFiber Optic Strain Sensor --|g13.3.1.4.|tFiber Optic Accelerometers -- |g13.3.1.5.|tFiber Optic Gyroscope or Rotation Rate Sensors --|g13.3.1.6.|tFiber Optic Fabry-Perot Interferometer --|g13.4.|tPressure Sensor: Membrane Type - -|g13.4.1.|tPressure Sensor: Capillary Tip --|g13.5. |tBragg Grating Sensors --|g13.6.|tPolarization Maintaining Single-Mode Fibers --|g13.6.1.|tCurrent Measurement: Faraday Rotation --|g13.7.|tFiber Optic Biosensors --|g13.7.1.|tDirect Fiber Optic Sensors -- |g13.7.1.1.|tDirect Physical Sensors --|g13.7.1.2.|tDirect Chemical Sensors --|g13.7.2.|tIndirect Fiber Optic Sensors --|g13.7.2.1.|tIndirect Physical Sensors --|g13.7.2.2. |tIndirect Chemical Sensors --|tProblems --|g14.1. |tIntroduction --|g14.2.|tMeasurement of Gauge Blocks and Slip Gauges --|g14.2.1.|tMethod of Exact Fractions -- |g14.3.|tGauge Block Interferometry: Comparison with a Standard --|g14.3.1.|tSingle Wavelength Interferometry for Gauge Blocks --|g14.4.|tComb Generation and Gauge Block Calibration --|g14.4.1.|tMeasurement of Gauge Block with Optical Comb --|g14.4.2.|tDistance Measurement with Frequency Comb --|g14.5.|tModulated Frequency-Displacement Sensor --|g14.5.1.|tFrequency-Modulated Continuous Wave Laser Radar --|g14.6.|tDisplacement Measurement with Interferometry --|g14.6.1.|tTwo-Frequency Laser Interferometer for Displacement Measurement --|g14.7. |tAngle Interferometer --|g14.8.|tMoire Technique for Displacement Measurement --|g14.9.|tDisplacement Distribution Measurement --|g14.9.1.|tHologram Interferometry --|g14.9.2.|tMeasurement of Amplitude of Vibration --|g14.9.3.|tElectronic Detection: Electronic Speckle Pattern Interferometry/Digital Speckle Pattern Interferometry and Speckle Photography --|g14.10.|tMoire Techniques --|g14.10.1.|tMeasurement of In-Plane Displacement/Deformation --|g14.10.2.|tTwo-Dimensional In- Plane Displacement Measurement --|g14.10.3.|tHigh Sensitivity In-Plane Displacement Measurement --|g14.10.4. |tMeasurement of Out-of-Plane Component --|g14.10.4.1. |tShadow Moire Method --|g14.10.4.2.|tProjection Moire -- |g14.10.5.|tMeasurement of Amplitudes of Vibration -- |g14.10.6.|tReflection Moire Method --|g14.10.7.|tSlope Determination for Dynamic Events --|g14.11.|tDigital Image Correlation --|tProblems. 520 3 Introduction to Optical Metrology examines the theory and practice of various measurement methodologies utilizing the wave nature of light. The book begins by introducing the subject of optics, and then addresses the propagation of laser beams through free space and optical systems. After explaining how a Gaussian beam propagates, how to set up a collimator to get a collimated beam for experimentation, and how to detect and record optical signals. 590 O'Reilly|bO'Reilly Online Learning: Academic/Public Library Edition 650 0 Optical measurements. 650 0 Metrology. 650 0 Wave theory of light. 650 6 Mesures optiques. 650 6 Métrologie. 650 6 Théorie ondulatoire de la lumière. 650 7 Metrology|2fast 650 7 Optical measurements|2fast 650 7 Wave theory of light|2fast 776 08 |iPrint version:|z9781482236101 830 0 Optical sciences and applications of light. 856 40 |uhttps://ezproxy.naperville-lib.org/login?url=https:// learning.oreilly.com/library/view/~/9781482236118/?ar 938 CRC Press|bCRCP|nCRC0KE26019PDF 938 EBSCOhost|bEBSC|n1499441 938 YBP Library Services|bYANK|n13265935 938 YBP Library Services|bYANK|n15339920 994 92|bJFN