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LEADER 00000cam a2201033 a 4500
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024 7 10.1002/9780470618943|2doi
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049 INap
082 04 621.3815/31
082 04 621.3815/31|222
099 eBook O’Reilly for Public Libraries
100 1 Ma, Xu,|d1983-|1https://id.oclc.org/worldcat/entity/
E39PCjHtWGMqM49HHwG3fM4jG3
245 10 Computational lithography /|cXu Ma and Gonzalo R. Arce.
|h[O'Reilly electronic resource]
260 Hoboken, N.J. :|bWiley,|c©2010.
300 1 online resource (xv, 226 pages) :|billustrations
336 text|btxt|2rdacontent
337 computer|bc|2rdamedia
338 online resource|bcr|2rdacarrier
490 1 Wiley series in pure and applied optics
504 Includes bibliographical references and index.
505 0 Optical Lithography Systems -- Rule-Based Resolution
Enhancement Techniques -- Fundamentals of Optimization --
Computational Lithography with Coherent Illumination --
Regularization Framework -- Computational Lithography with
Partially Coherent Illumination -- Other RET Optimization
Techniques -- Source and Mask Optimization -- Coherent
Thick-Mask Optimization -- Conclusions and New Directions
of Computational Lithography -- Appendix A: Formula
Derivation in Chapter 5 -- Appendix B: Manhattan Geometry
-- Appendix C: Formula Derivation in Chapter 6 -- Appendix
D: Formula Derivation in Chapter 7 -- Appendix E: Formula
Derivation in Chapter 8 -- Appendix F: Formula Derivation
in Chapter 9 -- Appendix G: Formula Derivation in Chapter
10 -- Appendix H: Software Guide.
520 A Unified Summary of the Models and Optimization Methods
Used in Computational Lithography. Optical lithography is
one of the most challenging areas of current integrated
circuit manufacturing technology. The semiconductor
industry is relying more on resolution enhancement
techniques (RETs), since their implementation does not
require significant changes in fabrication infrastructure.
Computational Lithography is the first book to address the
computational optimization of RETs in optical lithography,
providing an in-depth discussion of optimal optical
proximity correction (OPC), phase shifting.
588 0 Print version record.
590 O'Reilly|bO'Reilly Online Learning: Academic/Public
Library Edition
650 0 Microlithography|xMathematics.
650 0 Integrated circuits|xDesign and construction|xMathematics.
650 0 Photolithography|xMathematics.
650 0 Semiconductors|xEtching|xMathematics.
650 0 Resolution (Optics)
650 6 Microlithographie|xMathématiques.
650 6 Circuits intégrés|xConception et construction
|xMathématiques.
650 6 Photolithographie|xMathématiques.
650 6 Semi-conducteurs|xAttaque chimique|xMathématiques.
650 6 Résolution (Optique)
650 7 resolution (optical concept)|2aat
650 7 Resolution (Optics)|2fast
700 1 Arce, Gonzalo R.
776 08 |iPrint version:|aMa, Xu, 1983-|tComputational
lithography.|dHoboken, N.J. : Wiley, ©2010|z9780470596975
|w(DLC) 2009049250|w(OCoLC)460050552
830 0 Wiley series in pure and applied optics.
856 40 |uhttps://ezproxy.naperville-lib.org/login?url=https://
learning.oreilly.com/library/view/~/9781118043578/?ar
|zAvailable on O'Reilly for Public Libraries
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