LEADER 00000cam a2200805 i 4500 001 915940266 003 OCoLC 005 20240129213017.0 006 m o d 007 cr cnu|||unuuu 008 150806t20162016flu ob 001 0 eng d 019 918623604|a919191801|a1058608993 020 9781498711760|q(electronic bk.) 020 1498711766|q(electronic bk.) 020 1498711758|q(hardcover ;|qalk. paper) 020 9781498711753|q(hardcover ;|qalk. paper) 020 9781498733878 020 1498733875 024 7 10.1201/b18745|2doi 029 1 AU@|b000055402118 029 1 DEBSZ|b456590587 029 1 GBVCP|b833106791 029 1 NZ1|b16308109 035 (OCoLC)915940266|z(OCoLC)918623604|z(OCoLC)919191801 |z(OCoLC)1058608993 040 N$T|beng|erda|epn|cN$T|dN$T|dIDEBK|dYDXCP|dUIU|dCUS|dOCLCF |dVLB|dUAB|dCAUOI|dWAU|dEBLCP|dNLGGC|dCRCPR|dCOO|dDEBSZ |dOCLCQ|dCNCGM|dOTZ|dOCLCQ|dBUF|dERL|dOCLCQ|dCEF|dOCLCQ |dU3W|dWYU|dS9I|dYDX|dTYFRS|dLEAUB|dOCLCQ|dUHL|dOCLCO |dOCLCQ|dSFB|dOCLCQ|dOCLCO|dOCLCL 049 INap 082 04 620.1/1228 082 04 620.1/1228|223 099 eBook O'Reilly for Public Libraries 100 1 Yamada, I.|q(Isao),|eauthor.|1https://id.oclc.org/worldcat /entity/E39PCjG88pK4W8b7yTCpqdCpvb 245 10 Materials processing by cluster ion beams :|bhistory, technology, and applications /|cIsao Yamada.|h[O'Reilly electronic resource] 264 1 Boca Raton, FL :|bCRC Press,|c[2016] 264 4 |c©20 264 4 |c©2016 300 1 online resource (xv, 244 pages) 336 text|btxt|2rdacontent 337 computer|bc|2rdamedia 338 online resource|bcr|2rdacarrier 347 data file 504 Includes bibliographical references and index. 505 0 Ion beam technology : overview and history -- History and milestones of cluster beam development -- Development of cluster beam sources for solid materials -- Gas cluster ion beam equipment -- Cluster ion-solid surface interaction kinetics -- Cluster ion beam sputtering -- Cluster ion implantation -- Cluster ion beam-assisted deposition -- Applications -- Conclusions. 520 Materials Processing by Cluster Ion Beams: History, Technology, and Applications discusses the contemporary physics, materials science, surface engineering issues, and nanotechnology capabilities of cluster beam processing. Written by the originator of the gas cluster ion beam (GCIB) concept, this book: offers an overview of ion beam technologies, from the discovery of monomer ions to the introduction of GCIBs; explores the development of sources for producing cluster beams from solid materials; describes the engineering characteristics of gas cluster ion beam equipment; covers cluster ion-solid surface interaction kinetics as well as sputtering, implantation, and ion-assisted deposition; details surface processing techniques for smoothing, shallow implantation, and preparation of high-quality thin films; introduces representative examples of emerging GCIB industrial applications. 588 0 Print version record. 590 O'Reilly|bO'Reilly Online Learning: Academic/Public Library Edition 650 0 Ion bombardment. 650 0 Complex ions. 650 0 Materials|xEffect of radiation on. 650 0 Nanostructured materials. 650 6 Bombardement ionique. 650 6 Ions complexes. 650 6 Matériaux|xEffets du rayonnement sur. 650 6 Nanomatériaux. 650 7 Complex ions|2fast 650 7 Ion bombardment|2fast 650 7 Materials|xEffect of radiation on|2fast 650 7 Nanostructured materials|2fast 776 08 |iPrint version:|aYamada, I. (Isao).|tMaterials processing by cluster ion beams.|dBoca Raton : CRC Press, Taylor & Francis Group, [2016]|z9781498711753|w(DLC) 2015027379 |w(OCoLC)897785533 856 40 |uhttps://ezproxy.naperville-lib.org/login?url=https:// learning.oreilly.com/library/view/~/9781498711760/?ar |zAvailable on O'Reilly for Public Libraries 938 EBL - Ebook Library|bEBLB|nEBL2130181 938 EBSCOhost|bEBSC|n1048844 938 ProQuest MyiLibrary Digital eBook Collection|bIDEB |ncis31469581 938 Taylor & Francis|bTAFR|nCRC0KE31731PDF 938 Taylor & Francis|bTAFR|n9780429194573 938 YBP Library Services|bYANK|n15924983 938 YBP Library Services|bYANK|n12383248 938 YBP Library Services|bYANK|n12257857 994 92|bJFN