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LEADER 00000cam a2200805 i 4500
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008 150806t20162016flu ob 001 0 eng d
019 918623604|a919191801|a1058608993
020 9781498711760|q(electronic bk.)
020 1498711766|q(electronic bk.)
020 1498711758|q(hardcover ;|qalk. paper)
020 9781498711753|q(hardcover ;|qalk. paper)
020 9781498733878
020 1498733875
024 7 10.1201/b18745|2doi
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029 1 GBVCP|b833106791
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082 04 620.1/1228
082 04 620.1/1228|223
099 eBook O'Reilly for Public Libraries
100 1 Yamada, I.|q(Isao),|eauthor.|1https://id.oclc.org/worldcat
/entity/E39PCjG88pK4W8b7yTCpqdCpvb
245 10 Materials processing by cluster ion beams :|bhistory,
technology, and applications /|cIsao Yamada.|h[O'Reilly
electronic resource]
264 1 Boca Raton, FL :|bCRC Press,|c[2016]
264 4 |c©20
264 4 |c©2016
300 1 online resource (xv, 244 pages)
336 text|btxt|2rdacontent
337 computer|bc|2rdamedia
338 online resource|bcr|2rdacarrier
347 data file
504 Includes bibliographical references and index.
505 0 Ion beam technology : overview and history -- History and
milestones of cluster beam development -- Development of
cluster beam sources for solid materials -- Gas cluster
ion beam equipment -- Cluster ion-solid surface
interaction kinetics -- Cluster ion beam sputtering --
Cluster ion implantation -- Cluster ion beam-assisted
deposition -- Applications -- Conclusions.
520 Materials Processing by Cluster Ion Beams: History,
Technology, and Applications discusses the contemporary
physics, materials science, surface engineering issues,
and nanotechnology capabilities of cluster beam
processing. Written by the originator of the gas cluster
ion beam (GCIB) concept, this book: offers an overview of
ion beam technologies, from the discovery of monomer ions
to the introduction of GCIBs; explores the development of
sources for producing cluster beams from solid materials;
describes the engineering characteristics of gas cluster
ion beam equipment; covers cluster ion-solid surface
interaction kinetics as well as sputtering, implantation,
and ion-assisted deposition; details surface processing
techniques for smoothing, shallow implantation, and
preparation of high-quality thin films; introduces
representative examples of emerging GCIB industrial
applications.
588 0 Print version record.
590 O'Reilly|bO'Reilly Online Learning: Academic/Public
Library Edition
650 0 Ion bombardment.
650 0 Complex ions.
650 0 Materials|xEffect of radiation on.
650 0 Nanostructured materials.
650 6 Bombardement ionique.
650 6 Ions complexes.
650 6 Matériaux|xEffets du rayonnement sur.
650 6 Nanomatériaux.
650 7 Complex ions|2fast
650 7 Ion bombardment|2fast
650 7 Materials|xEffect of radiation on|2fast
650 7 Nanostructured materials|2fast
776 08 |iPrint version:|aYamada, I. (Isao).|tMaterials processing
by cluster ion beams.|dBoca Raton : CRC Press, Taylor &
Francis Group, [2016]|z9781498711753|w(DLC) 2015027379
|w(OCoLC)897785533
856 40 |uhttps://ezproxy.naperville-lib.org/login?url=https://
learning.oreilly.com/library/view/~/9781498711760/?ar
|zAvailable on O'Reilly for Public Libraries
938 EBL - Ebook Library|bEBLB|nEBL2130181
938 EBSCOhost|bEBSC|n1048844
938 ProQuest MyiLibrary Digital eBook Collection|bIDEB
|ncis31469581
938 Taylor & Francis|bTAFR|nCRC0KE31731PDF
938 Taylor & Francis|bTAFR|n9780429194573
938 YBP Library Services|bYANK|n15924983
938 YBP Library Services|bYANK|n12383248
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