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LEADER 00000cam a2200577 i 4500
001 961849984
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007 cr |n|||||||||
008 141212t20152015enka ob 001 0 eng d
020 9780323313032
020 0323313035
020 9780323311458|q(e-book)
020 0323311458
029 1 AU@|b000053951583
029 1 AU@|b000072989791
035 (OCoLC)961849984
040 VT2|beng|epn|cVT2|dOCLCO|dOCLCQ|dLVT|dCOO|dVT2|dOCLCA
|dOCLCF|dCEF|dOCLCQ|dAU@|dOCLCO|dOCLCQ|dOCLCO
049 INap
082 04 620.44
082 04 620.44|223
099 eBook O'Reilly for Public Libraries
245 00 Developments in surface contamination and cleaning.
|nVolume 7 :|bcleanliness validation and verification /
|cedited by Rajiv Kohli and K.L. Mittal ; contributors,
David E. Albert [and six others].|h[O'Reilly electronic
resource]
250 First edition.
260 Kidlington, England ;|aWaltham, Massachusetts :|bWilliam
Andrew,|c2015.
264 4 |c©2015
300 1 online resource (207 pages) :|billustrations, tables
336 text|btxt|2rdacontent
337 computer|bc|2rdamedia
338 online resource|bcr|2rdacarrier
504 Includes bibliographical references at the end of each
chapters and index.
505 0 Front Cover; Developments in Surface Contamination and
Cleaning: Cleanliness Validation and Verification;
Copyright; Contents; Contributors; Preface; About the
Editors; Chapter 1: Sources and Generation of Surface
Contaminants and Their Impact; 1. Introduction; 2. Surface
Cleanliness Levels; 3. Sources and Generation of
Contaminants; 3.1. Particles; 3.2. Thin Film or Molecular
Contamination; 3.3. Ionic Contamination; 3.4. Microbial
Contamination; 4. Impact of Contaminants; 4.1. Particle
Contamination; 4.1.1. Health Effects; 4.2. Molecular
Contamination; 4.3. Ionic Contamination.
505 8 4.4. Microbial Contamination5. Summary and Conclusions;
Acknowledgments; Disclaimer; References; Chapter 2: Mid-IR
Spectroscopy as a Tool for Cleanliness Validation; 1.
Background; 2. Principles of Grazing-Angle FTIR; 3.
Description of the Method; 4. Advantages and
Disadvantages; 4.1. Direct, Real-Time Method; 4.2. Detect
Anything With An IR Spectrum; 4.3. Automation; 4.4. Access
to Small Spaces/Flat Surfaces; 5. Results and
Applications; 5.1. Aerospace; 5.2. Manufacturing; 5.3.
Pharmaceutical Applications; 5.4. Explosives and Chemical
Warfare Agents; 5.5. Tank Trials.
505 8 5.6. IRRAS by Direct Reflectance6. Future Developments; 7.
Summary; References; Chapter 3: Optically Stimulated
Electron Emission: A Powerful Tool for Surface Cleanliness
Monitoring; 1. Introduction; 2. OSEE Principle; 2.1.
Resolution; 2.2. Repeatability and Reproducibility; 2.3.
Calibration; 2.4. Factors Affecting OSEE; 2.4.1. Short-
Term Factors; 2.4.1.1. Length of Time the Sample Surface
is Exposed to UV Light; 2.4.1.2. Distance of the OSEE
Sensor from the Surface; 2.4.1.3. Line Voltage; 2.4.1.4.
Ambient Temperature; 2.4.1.5. Atmospheric Pressure;
2.4.1.6. Sample Not Properly Grounded.
505 8 2.4.1.7. Surface Finish2.4.1.8. Air Flow/Turbulence Past
the OSEE Sensor; 2.4.1.9. Humidity; 2.4.1.10. Static
Charge; 2.4.2. Long-Term Factors; 2.4.2.1. UV Light
Intensity; 2.4.2.2. Collector Bias Voltage; 3.
Photoemitting Materials; 3.1. Substrate Emitting and
Contaminant Nonemitting; 3.2. Substrate Nonemitting and
Contaminant Emitting; 3.3. Both Substrate and Contaminant
Emitting; 3.4. Both Substrate and Contaminant Nonemitting;
4. Applications of OSEE; 4.1. Surface Cleanliness
Monitoring; 4.1.1. Establishing Surface Cleanliness Level.
505 8 4.1.1.1. Selecting an Appropriate Cleanliness Monitoring
Technique4.1.1.2. Establishing Acceptable Level of
Cleanliness; 4.1.1.2.1. Empirical Approach; 4.1.1.2.2.
Quantitative Approach; 4.1.2. Example Applications of
Surface Cleanliness Monitoring; 4.1.2.1. Prebond Surface
Quality; 4.1.2.1.1. Application 1; 4.1.2.1.2. Application
2; 4.1.2.1.3. Application 3; 4.1.2.2. Surface Finish;
4.1.2.3. Selecting the ""Right"" Cleaning Process;
4.1.2.4. Optimizing a Cleaning Process; 4.1.2.5.
Contamination Detection on Weld Surfaces; 4.1.2.6. Copper
Foil Characterization and Cleanliness Testing.
520 As device sizes in the semiconductor industries are
shrinking, they become more vulnerable to smaller
contaminant particles, and most conventional cleaning
techniques employed in the industry are not as effective
at smaller scales. The book series Developments in Surface
Contamination and Cleaning as a whole provides an
excellent source of information on these alternative
cleaning techniques as well as methods for
characterization and validation of surface contamination.
Each volume has a particular topical focus, covering the
key techniques and recent developments in the area. The
chapters in this Volume address the sources of surface
contaminants and various methods for their collection and
characterization, as well as methods for cleanliness
validation. Regulatory aspects of cleaning are also
covered. The collection of topics in this book is unique
and complements other volumes in this series. Edited by
the leading experts in small-scale particle surface
contamination, cleaning and cleaning control, these books
will be an invaluable reference for researchers and
engineers in R & D, manufacturing, quality control and
procurement specification situated in a multitude of
industries such as: aerospace, automotive, biomedical,
defense, energy, manufacturing, microelectronics, optics
and xerography.
588 0 Online resource; title from PDF title page (ebrary, viewed
December 12, 2014).
590 O'Reilly|bO'Reilly Online Learning: Academic/Public
Library Edition
650 0 Surfaces (Technology)
650 0 Surface contamination|xPrevention.
650 6 Surfaces (Technologie)
650 7 Surfaces (Technology)|2fast
700 1 Kohli, Rajiv.
700 1 Mittal, K. L.
700 1 Albert, David E.
776 08 |iPrint version:|tDevelopments in surface contamination
and cleaning. Volume 7.|bFirst edition.|dKidlington,
England ; Waltham, Massachusetts : William Andrew, ©2015
|hxvi, 190 pages|z9780323313032
856 40 |uhttps://ezproxy.naperville-lib.org/login?url=https://
learning.oreilly.com/library/view/~/9780323313032/?ar
|zAvailable on O'Reilly for Public Libraries
936 BATCHLOAD
994 92|bJFN