| Description |
1 online resource (xv, 226 pages) : illustrations |
| Series |
Wiley series in pure and applied optics |
|
Wiley series in pure and applied optics.
|
| Contents |
Optical Lithography Systems -- Rule-Based Resolution Enhancement Techniques -- Fundamentals of Optimization -- Computational Lithography with Coherent Illumination -- Regularization Framework -- Computational Lithography with Partially Coherent Illumination -- Other RET Optimization Techniques -- Source and Mask Optimization -- Coherent Thick-Mask Optimization -- Conclusions and New Directions of Computational Lithography -- Appendix A: Formula Derivation in Chapter 5 -- Appendix B: Manhattan Geometry -- Appendix C: Formula Derivation in Chapter 6 -- Appendix D: Formula Derivation in Chapter 7 -- Appendix E: Formula Derivation in Chapter 8 -- Appendix F: Formula Derivation in Chapter 9 -- Appendix G: Formula Derivation in Chapter 10 -- Appendix H: Software Guide. |
| Bibliography |
Includes bibliographical references and index. |
| Summary |
A Unified Summary of the Models and Optimization Methods Used in Computational Lithography. Optical lithography is one of the most challenging areas of current integrated circuit manufacturing technology. The semiconductor industry is relying more on resolution enhancement techniques (RETs), since their implementation does not require significant changes in fabrication infrastructure. Computational Lithography is the first book to address the computational optimization of RETs in optical lithography, providing an in-depth discussion of optimal optical proximity correction (OPC), phase shifting. |
| Subject |
Microlithography -- Mathematics.
|
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Integrated circuits -- Design and construction -- Mathematics.
|
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Photolithography -- Mathematics.
|
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Semiconductors -- Etching -- Mathematics.
|
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Resolution (Optics)
|
|
Microlithographie -- Mathématiques. |
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Circuits intégrés -- Conception et construction -- Mathématiques. |
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Photolithographie -- Mathématiques. |
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Semi-conducteurs -- Attaque chimique -- Mathématiques. |
|
Résolution (Optique) |
|
resolution (optical concept) |
|
Resolution (Optics) |
| Added Author |
Arce, Gonzalo R.
|
| Other Form: |
Print version: Ma, Xu, 1983- Computational lithography. Hoboken, N.J. : Wiley, ©2010 9780470596975 (DLC) 2009049250 (OCoLC)460050552 |
| ISBN |
9780470618943 (electronic bk.) |
|
0470618949 (electronic bk.) |
|
9780470618936 (electronic bk.) |
|
0470618930 (electronic bk.) |
|
9780470596975 (cloth) |
|
047059697X (cloth) |
|
9781118043578 |
|
111804357X |
| Standard No. |
10.1002/9780470618943 doi |
|
9786612755965 |
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